Title
Electromigration Subjected To Joule Heating Under Pulsed Dc Stress
Keywords
Duty factor; Electromigration; Joule heating; Mean-time-to-failure; Pulse-dc stress
Abstract
This article reports an electromigration-lifetime model that incorporates the effect of Joule heating under pulsed DC condition. This median-time-to-failure model accounts for applied current density, duty factor, frequency, thermal time constant, and interconnect geometry. The model predictions reported in this work agree very well with numerical simulation and experimental data over a wide range of current densities and frequencies. © 2001 Elsevier Science Ltd. All rights reserved.
Publication Date
12-1-2001
Publication Title
Solid-State Electronics
Volume
45
Issue
12
Number of Pages
2051-2056
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1016/S0038-1101(01)00185-X
Copyright Status
Unknown
Socpus ID
0035545598 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0035545598
STARS Citation
Wu, W.; Yuan, J. S.; and Kang, S. H., "Electromigration Subjected To Joule Heating Under Pulsed Dc Stress" (2001). Scopus Export 2000s. 113.
https://stars.library.ucf.edu/scopus2000/113