Title
Fixed Wavelength Selection For The Far-Infrared P-Ge Laser Using Thin Silicon Intracavity Etalon
Keywords
Far-infrared; p-Germanium; Semiconductor Laser; Sub-millimeter; Terahertz; Tunable Laser
Abstract
A thin two-side polished silicon etalon is demonstrated as a fixed-wavelength intracavity selector for the far-infrared p-Ge laser. The active cavity finesse is ∼ 0.1. The wavelength position and spectral purity are maintained over a wide range of laser operating fields. A p-Ge laser with such a selector may find application in chemical sensing, THz imaging, or non-destructive testing.
Publication Date
9-29-2003
Publication Title
Proceedings of SPIE - The International Society for Optical Engineering
Volume
4968
Number of Pages
18-23
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1117/12.478952
Copyright Status
Unknown
Socpus ID
0141493773 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0141493773
STARS Citation
Du Bosq, T. W.; Peale, R. E.; and Nelson, E. W., "Fixed Wavelength Selection For The Far-Infrared P-Ge Laser Using Thin Silicon Intracavity Etalon" (2003). Scopus Export 2000s. 1588.
https://stars.library.ucf.edu/scopus2000/1588