Title

Additive Lithography For Fabrication Of Diffractive Optics

Abstract

An innovative fabrication technique is introduced that is based on multiple-exposure techniques for micro-optics fabrication. This method utilizes various exposure times and combinations of binary and analog photo masks to sculpture complex photoresist profiles. It also demonstrates the fabrication of analog structures from the multilevel structures thus formed by using resist reflow. © 2002 Optical Society of America.

Publication Date

10-10-2002

Publication Title

Applied Optics

Volume

41

Issue

29

Number of Pages

6176-6181

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1364/AO.41.006176

Socpus ID

0037057804 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0037057804

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