Title
A Physics-Based Model For The Substrate Resistance Of Mosfets
Keywords
Electrostatic discharge; Impact ionization; Modeling; MOSFETs; Substrate resistance
Abstract
A compact and accurate model for the substrate resistance is essential and critical for the characterization of MOSFET operation, particularly for the case of relatively large drain current and sizeable substrate current. This paper develops such a model taking into account the effects of device geometry, impact ionization, and conductivity modulation. Comparison of the present and existing models is given, and results obtained from device simulation are included in support of the model. © 2002 Published by the Elsevier Science Ltd.
Publication Date
6-1-2002
Publication Title
Solid-State Electronics
Volume
46
Issue
6
Number of Pages
853-857
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1016/S0038-1101(01)00345-8
Copyright Status
Unknown
Socpus ID
0036604619 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0036604619
STARS Citation
Gao, X. F.; Liou, J. J.; and Ortiz-Conde, A., "A Physics-Based Model For The Substrate Resistance Of Mosfets" (2002). Scopus Export 2000s. 2551.
https://stars.library.ucf.edu/scopus2000/2551