Title
Mos Rf Reliability Subject To Dynamic Voltage Stress - Modeling And Analysis
Keywords
Breakdown (BD); Circuit reliability; Hot carriers (HCs); MOS devices; Power amplifiers; Stress
Abstract
Dynamic stress on MOSFETs with 900-MHz inverter-like waveforms as well as static (or dc) stress were evaluated experimentally. It showed that the degradation due to dynamic stress is less than that of dc stress for our test transistors. A compact model is used to evaluate the degradation in radio frequency performances, such as transconductance, cutoff frequency, linearity, and noise figure. A class-AB power amplifier is presented as an example to demonstrate the effect of dynamic stress on RF circuit performance. © 2005 IEEE.
Publication Date
8-1-2005
Publication Title
IEEE Transactions on Electron Devices
Volume
52
Issue
8
Number of Pages
1751-1758
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1109/TED.2005.852546
Copyright Status
Unknown
Socpus ID
23344449696 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/23344449696
STARS Citation
Yu, Chuanzhao and Yuan, J. S., "Mos Rf Reliability Subject To Dynamic Voltage Stress - Modeling And Analysis" (2005). Scopus Export 2000s. 3833.
https://stars.library.ucf.edu/scopus2000/3833