Title
A Compact Model For Reliability Simulation Of Deep-Submicron Mos Devices And Circuits
Abstract
Continuing down scaling in CMOS technology has resulted in an increasing and urgent need for a Spice-like reliability model that is capable of predicting the long-term degradation of MOS devices and ICs. In this paper, we develop such a model based on the industry standard BSIM3 model and empirical degradation expressions for the threshold voltage and mobility of MOSFETs. The model is implemented in Cadence Spectre via Verilog-A, and measured data obtained from devices fabricated from the 0.18-μm CMOS technology have been included in support of the model development. © 2005 IEEE.
Publication Date
1-1-2005
Publication Title
2005 IEEE Conference on Electron Devices and Solid-State Circuits, EDSSC
Number of Pages
391-396
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1109/EDSSC.2005.1635289
Copyright Status
Unknown
Socpus ID
43549091797 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/43549091797
STARS Citation
Cui, Zhi and Liou, Juin J., "A Compact Model For Reliability Simulation Of Deep-Submicron Mos Devices And Circuits" (2005). Scopus Export 2000s. 4333.
https://stars.library.ucf.edu/scopus2000/4333