Keywords

Thin films, RF sputtering deposition, DC sputtering deposition, Resistor and capacitor test structures, Process parameter optimization, Electrical characterization

Abstract

The ability to do thin film processing has been established at UCF. This paper describes the facilities available. RF and DC sputtering was used for material deposition. The parameters for both were established experimentally, and the results are presented. Resistor and capacitor test patterns were used to test the accuracy of the system. The devices were fabricated and tested; experimental results are discussed.

Notes

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Graduation Date

1984

Semester

Summer

Advisor

Malocha, Donald C.

Degree

Master of Science (M.S.)

College

College of Engineering

Degree Program

Engineering

Format

PDF

Pages

42 pages

Language

English

Rights

Public Domain

Length of Campus-only Access

None

Access Status

Masters Thesis (Open Access)

Identifier

DP0015587

Subjects

Thin film devices--Design and construction; Thin films--Technique; Thin films--Testing; Thin films--Materials; Thin films--Experiments

Accessibility Status

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