Keywords
Thin films
Abstract
The ability to do thin film processing has been established at UCF. This paper describes the facilities available. RF and DC sputtering was used for material deposition. The parameters for both were established experimentally, and the results are presented. Resistor and capacitor test patterns were used to test the accuracy of the system. The devices were fabricated and tested; experimental results are discussed.
Notes
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Graduation Date
1984
Semester
Summer
Advisor
Malocha, Donald C.
Degree
Master of Science (M.S.)
College
College of Engineering
Degree Program
Engineering
Format
Pages
42 p.
Language
English
Rights
Public Domain
Length of Campus-only Access
None
Access Status
Masters Thesis (Open Access)
Identifier
DP0015587
STARS Citation
Delpak, Ramzi, "Processing of Thin Film Devices" (1984). Retrospective Theses and Dissertations. 4676.
https://stars.library.ucf.edu/rtd/4676
Contributor (Linked data)
University of Central Florida. College of Engineering [VIAF]
Accessibility Status
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