The ability to do thin film processing has been established at UCF. This paper describes the facilities available. RF and DC sputtering was used for material deposition. The parameters for both were established experimentally, and the results are presented. Resistor and capacitor test patterns were used to test the accuracy of the system. The devices were fabricated and tested; experimental results are discussed.
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Malocha, Donald C.
Master of Science (M.S.)
College of Engineering
Length of Campus-only Access
Masters Thesis (Open Access)
Delpak, Ramzi, "Processing of Thin Film Devices" (1984). Retrospective Theses and Dissertations. 4676.
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